Directed Assembly of Lamellae‐ Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates
Advanced Materials2007Vol. 19(4), pp. 607–611
Citations Over TimeTop 10% of 2007 papers
Abstract
Lamellae-forming polystyrene-block-poly(methyl methacrylate) films were directed to assemble with perpendicularly oriented domains and long-range order in confining grooves (see figure), with preferential and neutral wetting in sidewalls and bottoms, respectively. The assembled films were highly amenable for pattern transfer by reactive-ion etching.
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