Liquid‐Phase Quasi‐Epitaxial Growth of Highly Stable, Monolithic UiO‐66‐NH2 MOF thin Films on Solid Substrates
ChemistryOpen2020Vol. 9(5), pp. 524–527
Citations Over TimeTop 17% of 2020 papers
Tawheed Hashem, Elvia P. Valadez Sánchez, Peter G. Weidler, Hartmut Gliemann, Mohamed H. Alkordi, Christof Wöll
Abstract
High quality, monolithic UiO-66-NH2 thin films on diverse solid substrates have been prepared via a low temperature liquid phase epitaxy method. The achievement of continuous films with low defect densities and great stability against high temperatures and hot water is proven, clearly outperforming other reported types of MOF thin films.
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