Recent progress in high resolution lithography
Polymers for Advanced Technologies2006Vol. 17(2), pp. 94–103
Citations Over TimeTop 1% of 2006 papers
Abstract
Abstract The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to “unconventional” soft lithography and the self‐assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two‐photon lithography, step‐and‐flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright © 2006 John Wiley & Sons, Ltd.
Related Papers
- → Layout optimizations for double patterning lithography(2009)11 cited
- → What is double patterning lithography and its impact on nanometer design?(2009)2 cited
- → PMJ 2002 Panel Discussion Review: Lithography Strategy from 90 to 65 nm Nodes: ArF, F 2 , or EPL?(2002)
- Next Generation Lithography and Equipment(2004)
- → Distributed optical proximity correction with deep-learning lithographic model for i-line photolithography(2021)