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P‐35: Photo‐Radically‐Curable Negative‐Tone Patternable Silicone
SID Symposium Digest of Technical Papers2023Vol. 54(1), pp. 1445–1447
Abstract
A novel photo‐radically‐curable negative‐tone patternable silicone resin was designed. The material thus developed showed good UV curability and excellent solubility in the standard alkaline etching solvent. Another advantage includes RI tunability. The new Si‐based patternable resin will be applied as photo‐resist for various display applications.
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