Formation of hafnium carbide thin films by plasma enhanced chemical vapor deposition from bis(η-cyclopentadienyl)dimethylhafnium as precursor
Applied Physics A1995Vol. 60(3), pp. 285–288
Citations Over TimeTop 23% of 1995 papers
Related Papers
- → Dicarbonylbis(η 5 ‐Cyclopentadienyl) Complexes of Titanium, Zirconium, and Hafnium(1986)22 cited
- → Hafnium and Hafnium Compounds(2013)12 cited
- → The synthesis and structure of silica-supported bis(h5-cyclopentadienyl)dichlorotitanium(IV) complexes(1986)9 cited
- → Hafnium and Hafnium Compounds(2000)4 cited
- → Hafnium and Hafnium Compounds(2000)3 cited