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Ultrabroadband and High-Detectivity Photodetector Based on WS₂/Ge Heterojunction through Defect Engineering and Interface Passivation

ACS Nano2021Vol. 15(6), pp. 10119–10129

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Di Wu, Jia–Wen Guo, Chao‐qiang Wang, Xiaoyan Ren, Yongsheng Chen, Pei Lin, Longhui Zeng, Zhifeng Shi, Xinjian Li, Chongxin Shan, Jiansheng Jie

Abstract

Broadband photodetectors are of great importance for numerous optoelectronic applications. Two-dimensional (2D) tungsten disulfide (WS₂), an important family member of transition-metal dichalcogenides (TMDs), has shown great potential for high-sensitivity photodetection due to its extraordinary properties. However, the inherent large bandgap of WS₂ and the strong interface recombination impede the actualization of high-sensitivity broadband photodetectors. Here, we demonstrate the fabrication of an ultrabroadband WS₂/Ge heterojunction photodetector through defect engineering and interface passivation. Thanks to the narrowed bandgap of WS₂ induced by the vacancy defects, the effective surface modification with an ultrathin AlO_x layer, and the well-designed vertical n-n heterojunction structure, the WS₂/AlO_x/Ge photodetector exhibits an excellent device performance in terms of a high responsivity of 634.5 mA/W, a large specific detectivity up to 4.3 × 1011 Jones, and an ultrafast response speed. Significantly, the device possesses an ultrawide spectral response spanning from deep ultraviolet (200 nm) to mid-wave infrared (MWIR) of 4.6 μm, along with a superior MWIR imaging capability at room temperature. The detection range has surpassed the WS₂-based photodetectors in previous reports and is among the broadest for TMD-based photodetectors. Our work provides a strategy for the fabrication of high-performance ultrabroadband photodetectors based on 2D TMD materials.

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Abstract

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