Organic Materials Challenges for 193 nm Imaging
Citations Over TimeTop 10% of 1999 papers
Abstract
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTOrganic Materials Challenges for 193 nm ImagingElsa Reichmanis, Omkaram Nalamasu, and Frank M. HoulihanView Author Information Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Murray Hill, New Jersey 07974 Cite this: Acc. Chem. Res. 1999, 32, 8, 659–667Publication Date (Web):February 19, 1999Publication History Received9 July 1998Published online19 February 1999Published inissue 1 August 1999https://pubs.acs.org/doi/10.1021/ar970150nhttps://doi.org/10.1021/ar970150nresearch-articleACS PublicationsCopyright © 1999 American Chemical SocietyRequest reuse permissionsArticle Views790Altmetric-Citations60LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Dissolution,Etching,Inhibitors,Materials,Polymers Get e-Alerts
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