Facile Method To Fabricate a Large-Scale Superhydrophobic Surface by Galvanic Cell Reaction
Chemistry of Materials2006Vol. 18(5), pp. 1365–1368
Citations Over TimeTop 10% of 2006 papers
Abstract
This paper describes the use of galvanic cell reaction as a facile method to chemically deposit Ag nanostructures on the p-silicon wafer on a large scale. When the Ag covered silicon wafer is further modified with a self-assembled monolayer of n-dodecanethiol, a superhydrophobic surface can be obtained with a contact angle of about 154° and a tilt angle lower than 5°.
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