Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions
Journal of the American Chemical Society2008Vol. 130(9), pp. 2793–2797
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Klas Andersson, Guido Ketteler, Hendrik Bluhm, Susumu Yamamoto, Hirohito Ogasawara, Lars G. M. Pettersson, Miquel Salmerón, Anders Nilsson
Abstract
Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.
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