Investigation of N2O Production from 266 and 532 nm Laser Flash Photolysis of O3/N2/O2 Mixtures
Citations Over TimeTop 10% of 2002 papers
Abstract
Tunable diode laser absorption spectroscopy has been employed to measure the amount of N2O produced from laser flash photolysis of O3/N2/O2 mixtures at 266 and 532 nm. In the 532 nm photolysis experiments very little N2O is observed, thus allowing an upper limit yield of 7 × 10-8 to be established for the process O3† + N2 → N2O + O2, where O3† is nascent O3 that is newly formed via O(3PJ) + O2 recombination (with vibrational excitation near the dissociation energy of O3). The measured upper limit yield is a factor of ∼600 smaller than a previous literature value and is approximately a factor of 10 below the threshold for atmospheric importance. In the 266 nm photolysis experiments, significant N2O production is observed and the N2O quantum yield is found to increase linearly with pressure over the range 100−900 Torr in air bath gas. The source of N2O in the 266 nm photolysis experiments is believed to be the addition reaction O(1D2) + N2 + M N2O + M, although reaction of (very short-lived) electronically excited O3 with N2 cannot be ruled out by the available data. Assuming that all observed N2O comes from the O(1D2) + N2 + M reaction, the following expression describes the temperature dependence of k6 (in its third-order low-pressure limit) that is consistent with the N2O yield data: k6 = (2.8 ± 0.1) × 10-36(T/300)-(0.88±0.36) cm6 molecule-2 s-1, where the uncertainties are 2σ and represent precision only. The accuracy of the reported rate coefficients at the 95% confidence level is estimated to be 30−40% depending on the temperature. Model calculations suggest that gas phase processes initiated by ozone absorption of a UV photon represent about 1.4% of the currently estimated global source strength of atmospheric N2O. However, these processes could account for a significant fraction of the oxygen mass-independent enrichment observed in atmospheric N2O, and they appear to be the first suggested photochemical mechanism that is capable of explaining the altitude dependence of the observed mass-independent isotopic signature.
Related Papers
- → Photolysis of a simple molecule on a metal surface—adsorbed O2 dissociation and desorption on Pd(111)(1989)55 cited
- → H and CH3 eliminations in the photodissociation of chlorotoluene(2003)14 cited
- → Heterolitic photolysis of O2 on Ag(1 0 0)(2005)5 cited
- → Photolysis of Nitrous Oxide. II. 1470 and 1830 A(1962)29 cited
- → Gas phase multiphoton photodissociation of Mn2(CO)10: The effect of collisions on photofragmentation(1981)24 cited