Hydroxyl-Induced Wetting of Metals by Water at Near-Ambient Conditions
The Journal of Physical Chemistry C2007Vol. 111(22), pp. 7848–7850
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Susumu Yamamoto, Klas Andersson, Hendrik Bluhm, Guido Ketteler, David E. Starr, Theanne Schiros, Hirohito Ogasawara, Lars G. M. Pettersson, Miquel Salmerón, Anders Nilsson
Abstract
We report different wetting properties of Cu(110) and Cu(111) at near-ambient conditions using in situ photoemission spectroscopy. At near-ambient conditions of pressure (1 Torr) and temperature (295 K), the Cu(110) surface is covered with a mixed OH and H2O layer, whereas the Cu(111) surface remains clean and adsorbate-free. We show that wetting is controlled by the presence of OH groups on the surface, acting as anchors for water adsorption. Hydroxylation of the Cu(110) surface is facilitated by a lower activation barrier for water dissociation compared to Cu(111).
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