Adsorption of Water on Cu2O and Al2O3 Thin Films
The Journal of Physical Chemistry C2008Vol. 112(26), pp. 9668–9672
Citations Over TimeTop 10% of 2008 papers
Abstract
The initial stages of water condensation, approximately 6 molecular layers, on two oxide surfaces, Cu2O and Al2O3, have been investigated by using ambient pressure X-ray photoelectron spectroscopy at relative humidity values (RH) from 0 to >90%. Water adsorbs first dissociatively on oxygen vacancies producing adsorbed hydroxyl groups in a stoichiometric reaction: Olattic + vacancies + H2O = 2OH. The reaction is completed at ∼1% RH and is followed by adsorption of molecular water. The thickness of the water film grows with increasing RH. The first monolayer is completed at ∼15% RH on both oxides and is followed by a second layer at 35−40% RH. At 90% RH, about 6 layers of H2O film have been formed on Al2O3.
Related Papers
- → Monolayer Behavior of Cyclic and Linear Forms of Surfactins: Thermodynamic Analysis of Langmuir Monolayers and AFM Study of Langmuir-Blodgett Monolayers(2014)13 cited
- → Stabilization of Langmuir monolayer of hydrophobic thiocholesterol molecules(2008)8 cited
- → On the characteristics of mixed Langmuir monolayer templates containing dipalmitoyl phosphatidylcholine for gold nanoparticle formation(2009)9 cited
- → On The Properties Of Surfactant Monolayers At Low Surface Tensions(2009)
- Metal-incorporated Langmuir Monolayers and Langmuir-Blodgett Films(2004)