Nanotribological Properties of Alkanephosphonic Acid Self-Assembled Monolayers on Aluminum Oxide: Effects of Fluorination and Substrate Crystallinity

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Abstract

Two phosphonic acid (PA) self-assembled monolayers (SAMs) are studied on three aluminum oxide surfaces: the C and R crystallographic planes of single crystal alpha-alumina (sapphire) and an amorphous vapor-deposited alumina thin film. SAMs are either fully hydrogenated CH3(CH2)17PO3H2 or semifluorinated CF3(CF2)7(CH2)11PO3H2. Atomic force microscope (AFM) topographic imaging reveals that the deposited films are homogeneous, atomically smooth, and stable for months in the laboratory environment. Static and advancing contact angle measurements agree with previous work on identical or similar films, but receding measurements suggest reduced coverage here. To enable reproducible nanotribology measurements with the AFM, a scanning protocol is developed that leads to a stable configuration of the silicon tip. Adhesion for the semifluorinated films is either comparable to or lower than that for the hydrogenated films, with a dependence on contact history observed. Friction between each film and the tips depends strongly upon the type of molecule, with the fluorinated species exhibiting substantially higher friction. Subtle but reproducible differences in friction are observed for a given SAM depending on the substrate, revealing differences in packing density for the SAMs on the different substrates. Friction is seen to increase linearly with load, a consequence of the tip's penetration into the monolayer.

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