Self-Assembled Monolayer Compatible with Metal Surface Acoustic Wave Devices on Lithium Niobate
Langmuir2008Vol. 24(9), pp. 5161–5165
Citations Over TimeTop 14% of 2008 papers
Abstract
The formation of a siloxane self-assembled monolayer (SAM) film on a lithium niobate substrate was investigated for surface acoustic wave (SAW) sensor devices for the detection of hydrogen. The most widely used SAM coupling reagent, octadecyltrichlorosilane, etches aluminum metal features that are integral to sensor devices, due to the formation of high local concentrations of hydrochloric acid. An alternative coupling reagent, octadecyltrimethoxysilane (OTMS), does not show any etching of metal parts. OTMS and related molecules are compatible with conventional SAW device manufacturing techniques and other devices that contain metal features susceptible to etching by acid released in the SAM formation process.
Related Papers
- → Characterization of silica surfaces hydrophobized by octadecyltrichlorosilane(1994)126 cited
- → Significantly improved stability of n-octadecyltrichlorosilane self-assembled monolayer by plasma pretreatment on mica(2007)13 cited
- → AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon(2016)4 cited
- Self Assembled Patterns of Ag Using Hydrophobic and Hydrophilic Surface Characteristics of Glass(2006)
- → Performance of Pentacene Based Organic Thin Film Transistor with an Octadecyltrichlorosilane Self-Assembled Monolayer Interface(2021)