Nanolithography Using High Transmission Nanoscale Bowtie Apertures
Nano Letters2006Vol. 6(3), pp. 361–364
Citations Over TimeTop 1% of 2006 papers
Abstract
We demonstrate that bowtie apertures can be used for contact lithography to achieve nanometer scale resolution. The bowtie apertures with a 30 nm gap size are fabricated in aluminum thin films coated on quartz substrates. Lithography results show that holes of sub-50-nm dimensions can be produced in photoresist by illuminating the apertures with a 355 nm laser beam polarized in the direction across the gap. Experimental results show enhanced transmission and light concentration of bowtie apertures compared to square and rectangular apertures of the same opening area. Finite different time domain simulations are used to explain the experimental results.
Related Papers
- → Ultrahigh Resolution Positive Working Photoresist For Half-Micron Photolithography(1989)3 cited
- → Contact photolithography modeling for thick photoresists layers(2022)1 cited
- → Study on fabrication process parameter estimation by visual measurement(2009)1 cited
- → Study on Fabrication Process Parameter Estimation by Visual Measurement(2007)
- Research and application of thick photoresist lithography using UV light(2003)