Supported Ru−Pt Bimetallic Nanoparticle Catalysts Prepared by Atomic Layer Deposition
Citations Over TimeTop 10% of 2010 papers
Abstract
Atomic layer deposition (ALD) is used to deposit ruthenium-platinum nanostructured catalysts using 2,4-(dimethylpentadienyl)(ethylcyclopentadienyl) ruthenium, trimethyl(methylcyclopentadienyl) platinum, and oxygen as precursors. Transmission electron microscopy shows discrete 1.2 nm nanoparticles decorating the surface of the spherical alumina support. The Ru-Pt particles are crystalline and have a crystal structure similar to pure platinum. X-ray fluorescence measurements show that the nanoparticle composition is controlled by the ratio of metal precursor ALD cycles. X-ray absorption spectroscopy at the Ru K-edge indicates a nearest neighbor Ru-Pt interaction consistent with a bimetallic composition. Methanol decomposition reactions further confirm a Ru-Pt interaction and show enhanced methanol conversion for the bimetallic nanoparticles when compared to catalysts comprised of a mixture of pure Pt and Ru nanoparticles of similar loading. These results demonstrate that ALD is a viable technique for synthesizing mixed-metal nanostructures suitable for catalysis and other applications.
Related Papers
- → Atomic Layer Processes for Material Growth and Etching—A Review(2021)19 cited
- → A Novel Chemical Route to Atomic Layer Deposition of ZnS Thin Film from Diethylzinc and 1,5‐Pentanedithiol(2017)8 cited
- → Study of potential quantization effects in designs for 12.4 nm mirrors(2005)
- → Progress in Pulse Plating Atomic Layer Deposition (PP-ALD)(2015)
- → Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”(2022)