In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth
Nano Letters2011Vol. 11(10), pp. 4154–4160
Citations Over TimeTop 1% of 2011 papers
Robert S. Weatherup, Bernhard C. Bayer, Raoul Blume, Caterina Ducati, Carsten Baehtz, Robert Schlögl, Stephan Hofmann
Abstract
Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm(2) is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.
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