Nucleation Control for Large, Single Crystalline Domains of Monolayer Hexagonal Boron Nitride via Si-Doped Fe Catalysts
Nano Letters2015Vol. 15(3), pp. 1867–1875
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Sabina Caneva, Robert S. Weatherup, Bernhard C. Bayer, Barry Brennan, Steven J. Spencer, Ken Mingard, Andrea Cabrero‐Vilatela, Carsten Baehtz, Andrew J. Pollard, Stephan Hofmann
Abstract
The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of ∼0.3 mm, and of continuous h-BN monolayer films with large domain sizes (>25 μm) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-film Fe/SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes a basis for further rational catalyst design for compound 2D materials.
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