Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing

Citations Over TimeTop 10% of 2010 papers

Abstract

Block copolymer self-assembly is an innovative technology capable of patterning technologically relevant substrates with nanoscale precision for a range of applications from integrated circuit fabrication to tissue interfacing, for example. In this article, we demonstrate a microwave-based method of rapidly inducing order in block copolymer structures. The technique involves the usage of a commercial microwave reactor to anneal block copolymer films in the presence of appropriate solvents, and we explore the effect of various parameters over the polymer assembly speed and defect density. The approach is applied to the commonly used poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) and poly(styrene)-b-poly(2-vinylpyridine) (PS-b-P2VP) families of block copolymers, and it is found that the substrate resistivity, solvent environment, and anneal temperature all critically influence the self-assembly process. For selected systems, highly ordered patterns were achieved in less than 3 min. In addition, we establish the compatibility of the technique with directed assembly by graphoepitaxy.

Related Papers

• → Studies of Styrene and 2-Vinylpyridine Block Copolymers; Preparation and Characterization(1986)31 cited
• → Copolymer analysis by UV spectroscopy(1986)18 cited
• → Copolymerization of styrene. I. Copolymerization with styrene derivatives containing nitrile groups in the side‐chain(1964)26 cited
• → Copolymerization of p‐triphenyltinstyrene and p‐triphenylleadstyrene with styrene or vinyltoluene(1965)6 cited
• → Relationship of the Sequence Distribution of a Polymer to the Catalytic Activity of Its Nd Complex(1990)5 cited