Plasma immersion ion implantation using plasmas generated by radio frequency techniques

Citations Over TimeTop 10% of 1988 papers

Abstract

Medium density (3×109 cm−3) and high density (3×1012 cm−3) plasmas, generated by low and medium power rf techniques, have been used for the implantation of 10–20 keV nitrogen ions into mild steel targets which were immersed in the plasma and biased to −20 kV. Use of the high density plasma resulted in significant damage to the surface by arcing. At medium densities the nitrogen was implanted to a depth and dose consistent with expectations, there was no arcing damage, and tests showed improved wear and hardness compatible with the level of implantation.

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