Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

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Abstract

A reflective polarizer consisting of two layers of 190 nm period metal gratings was fabricated using nanoimprint lithography. Measurements with a He–Ne laser (wavelength=632.8 nm) showed that at normal incidence, this polarizer reflects light polarized perpendicular to the grating lines (transverse magnetic polarization) with a reflectance of 54%, but strongly absorbs parallel-polarized light (transverse electric polarization) with a reflectance of only 0.25%. The enhanced polarization extinction ratio of over 200 at this wavelength is possibly related to the resonance between the two layers of metal gratings. This polarizer is thin, compact, and is suited for integrated optical systems.

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