Use of ion beams to decompose metalorganics into patterned thin-film superconductors
Applied Physics Letters1988Vol. 52(20), pp. 1741–1742
Citations Over TimeTop 11% of 1988 papers
Abstract
Ion implantation of 400 keV O+2 ions, at a dose of 5×1014 ions/cm2, was used to selectively decompose a high Tc superconductor-forming metalorganic (MO). Implantation rendered the metal carboxylates insoluble in their solvent, xylene, permitting patterning of the MO prior to pyrolysis and annealing. Fine line superconductors were formed having 90 K onset temperatures and zero resistance at 68 K.
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