Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena2009Vol. 27(2), pp. 568–572
Citations Over TimeTop 18% of 2009 papers
Junbo Feng, Yao Chen, J. Blair, Hamza Kurt, Ran Hao, D. S. Citrin, Christopher J. Summers, Zhiping Zhou
Abstract
In this article, the fabrication process of annular photonic crystals on silicon-on-insulator wafers was addressed for the first time. A self-alignment procedure for nanofabrication using atomic layer deposition and sacrificial etching was established to place accurately nanosized dielectric rods in nanosized circular air holes. Avoiding the challenging electron-beam lithography alignment, this method achieves atomic level precision and shows high stability.
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