Patrick Naulleau
Lawrence Berkeley National Laboratory(US)Vi Technology (United States)(US)Tetra Tech (United States)(US)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced X-ray Imaging Techniques, Optical measurement and interference techniques
Most-Cited Works
- → Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source(2014)96 cited
- → Hartmann wave-front measurement at 134 nm with λ_EUV/120 accuracy(2003)92 cited
- → Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy(1999)91 cited
- → Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic(2004)69 cited
- → Resist Materials for Extreme Ultraviolet Lithography: Toward Low‐Cost Single‐Digit‐Nanometer Patterning(2015)69 cited
- → Fundamental limits to EUV photoresist(2007)69 cited