Yoshinobu Ohya
Tokyo Electron (Japan)(JP)
Publications by Year
Research Areas
Plasma Diagnostics and Applications, Metal and Thin Film Mechanics, Semiconductor materials and devices, Plasma Applications and Diagnostics, Diamond and Carbon-based Materials Research
Most-Cited Works
- → Future of plasma etching for microelectronics: Challenges and opportunities(2024)115 cited
- → Human glycine decarboxylase gene ( GLDC) and its highly conserved processed pseudogene ( ψ GLDC) : their structure and expression, and the identification of a large deletion in a family with nonketotic hyperglycinemia(2000)40 cited
- → An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases(2023)22 cited
- → Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas(2017)18 cited
- → Photodetachment Study of Capacitively-Coupled RF C4F8Plasma(2000)17 cited
- → Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma(2016)17 cited
- → Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas(2017)14 cited
- → Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas(2016)14 cited
- → Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process(2022)11 cited
- → A new technique for laser photodetachment diagnostics of negative ions in processing plasmas using an open microwave resonator(2003)