A. Baunemann
Ruhr University Bochum(DE)
Publications by Year
Research Areas
Crystallization and Solubility Studies, X-ray Diffraction in Crystallography, Semiconductor materials and devices, Copper Interconnects and Reliability, Metal and Thin Film Mechanics
Most-Cited Works
- → Deposition of microcrystalline [Cu3(btc)2] and [Zn2(bdc)2(dabco)] at alumina and silica surfaces modified with patterned self assembled organic monolayers: evidence of surface selective and oriented growth(2007)225 cited
- → Selective Growth and MOCVD Loading of Small Single Crystals of MOF-5 at Alumina and Silica Surfaces Modified with Organic Self-Assembled Monolayers(2007)180 cited
- → Low‐Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self‐Limiting Surface Reaction of Copper Dimethylamino‐2‐propoxide with Diethylzinc(2009)98 cited
- → Mixed Guanidinato/Alkylimido/Azido Tungsten(VI) Complexes: Synthesis and Structural Characterization(2005)60 cited
- → Mixed amido/imido/guanidinato complexes of niobium: potential precursors for MOCVD of niobium nitride thin films(2008)51 cited
- → Guanidinate-Stabilized Monomeric Hafnium Amide Complexes as Promising Precursors for MOCVD of HfO2(2006)47 cited
- → Tantalum complexes with all nitrogen coordination sphere: mixed amido-, imido-, guanidinato complexes of tantalum and their thermal behaviour(2005)36 cited
- → Mononuclear precursor for MOCVD of HfO2 thin filmsElectronic supplementary information (ESI) available: TG/DTA, and isothermal studies, RBS and AFM data of HfO2 film. See http://www.rsc.org/suppdata/cc/b4/b405015k/(2004)28 cited
- → Mixed hydrazido amido/imido complexes of tantalum, hafnium and zirconium: potential precursors for metal nitrideMOCVD(2005)27 cited
- → Mixed Amido/Imido/Guanidinato Complexes of Tantalum: Effects of Ligand Substitution on Thermal Properties(2006)20 cited