Hiroyasu Toyoda
Publications by Year
Research Areas
Plasma Diagnostics and Applications, Metal and Thin Film Mechanics, Semiconductor materials and devices, Advanced Surface Polishing Techniques, Advanced Machining and Optimization Techniques
Most-Cited Works
- → Etching characteristics of SiO2 in CHF3 gas plasma(1980)14 cited
- → Frequency Effect on Material Selectivity in Gas Plasma Etching in Planar Type Reactor(1981)9 cited
- → Microfabrication Technique by Gas Plasma Etching Method(1976)4 cited
- → Etching of SiO2 in CF4 Gas Plasma Using Planar-Type Reactor(1981)4 cited
- → Plasma Etching of SiO2 Relief Having Tapered Wall(1980)3 cited
- → Chromium etching characteristics using a planar type plasma reactor(1982)2 cited
- → Chrome Mask Making(1970)
- Microfabrication Technique by Gas Plasma Etching Method : A-1: DEVICE TECHNOLOGY (I)(1976)
- B-60 Survey and analysis on air conditioning system of the office building : (Part 2) Consideration on various systems(1988)
- Capacitively Coupled Plasma Source with Comb-Type Electrodes for Uniform Plasma Processing(2010)