Kazuya Kadota
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Semiconductor materials and devices, Integrated Circuits and Semiconductor Failure Analysis, Advancements in Semiconductor Devices and Circuit Design, Advanced Surface Polishing Techniques
Most-Cited Works
- → Alkali‐Developable Silicon Containing Positive Photoresist (ASTRO) for a Two‐Layer Resist System: Preparation and Processing(1987)17 cited
- → <title>New Positive Photoresist For Critical Dimension Control</title>(1981)5 cited
- → A Rapid Prototyping of Real-Time Pattern Generator for Step-and-Scan Lithography Using Digital Micromirror Device(2007)4 cited
- → Novel MRC algorithms using GPGPU(2012)3 cited
- → <title>Submicrometer Pattern Correction For Optical Lithography</title>(1988)3 cited
- → Analysis for effects of mask defects to resist pattern using a three-dimensional photolithography simulator(1990)2 cited
- → Microwave Plasma Etching of Silicon Dioxide for Half-Micron ULSIs(1989)2 cited
- → New indexes of the 0.5-μm resolution resist for optical lithography(1990)1 cited
- → Resist Pattern Analysis For Submicron Feature Size Using 3-D Photolithography Simulator(1989)1 cited
- → Organized DFM(2009)