Nobuyuki Kuboi
Sony (Taiwan)(TW)
Publications by Year
Research Areas
Semiconductor materials and devices, Plasma Diagnostics and Applications, Advancements in Semiconductor Devices and Circuit Design, Metal and Thin Film Mechanics, Silicon and Solar Cell Technologies
Most-Cited Works
- → Future of plasma etching for microelectronics: Challenges and opportunities(2024)115 cited
- → Prediction of Fluctuations in Plasma–Wall Interactions Using an Equipment Engineering System(2009)39 cited
- → Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching(2017)39 cited
- → Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation(2019)34 cited
- → Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model(2015)26 cited
- → Modeling and Simulation of Plasma-Induced Damage Distribution during Hole Etching of SiO$_{2}$ over Si Substrate by Fluorocarbon Plasma(2012)17 cited
- → Insights into different etching properties of continuous wave and atomic layer etching processes for SiO2 and Si3N4 films using voxel-slab model(2019)17 cited
- → Advanced simulation technology for etching process design for CMOS device applications(2016)16 cited
- → Numerical Simulation Method for Plasma-Induced Damage Profile in SiO2 Etching(2011)16 cited
- → Effect of open area ratio and pattern structure on fluctuations in critical dimension and Si recess(2013)10 cited