Jo Finders
ASML (Netherlands)(NL)ASML (Netherlands)(NL)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Electron and X-Ray Spectroscopy Techniques, Advanced Surface Polishing Techniques, Semiconductor Quantum Structures and Devices
Most-Cited Works
- → EUV lithography performance for manufacturing: status and outlook(2016)87 cited
- → Pitch doubling through dual-patterning lithography challenges in integration and litho budgets(2007)87 cited
- → Improvements in resist performance towards EUV HVM(2017)62 cited
- → The future of EUV lithography: enabling Moore's Law in the next decade(2017)61 cited
- → Composition of selectively grown InxGa1−xAs structures from locally resolved Raman spectroscopy(1991)61 cited
- → Performance overview and outlook of EUV lithography systems(2015)52 cited
- → Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner