Geert Vandenberghe
IMEC(BE)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Electron and X-Ray Spectroscopy Techniques, Advanced Surface Polishing Techniques, Nanofabrication and Lithography Techniques
Most-Cited Works
- → Implementation of templated DSA for via layer patterning at the 7nm node(2015)114 cited
- → Integrated fab process for metal oxide EUV photoresist(2015)80 cited
- → Photoresists in extreme ultraviolet lithography (EUVL)(2017)46 cited
- → Metal oxide EUV photoresist performance for N7 relevant patterns and processes(2016)41 cited
- → Application challenges with double patterning technology (DPT) beyond 45 nm(2006)38 cited
- → The economic impact of EUV lithography on critical process modules(2014)31 cited
- → Printing the metal and contact layers for the 32- and 22-nm node: comparing positive and negative tone development process(2010)28 cited