Mathias Tomandl
IMS Nanofabrication (Austria)(AT)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Mechanical and Optical Resonators, Electron and X-Ray Spectroscopy Techniques, Quantum Information and Cryptography
Most-Cited Works
- → Quantum interference of large organic molecules(2011)377 cited
- → Realization of optical carpets in the Talbot and Talbot-Lau configurations(2009)138 cited
- → Simulated Interactive Research Experiments as Educational Tools for Advanced Science(2015)13 cited
- → Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography(2024)5 cited
- → Improvement of mask pattern placement error using novel resist charging control methodology in multi-beam mask writer(2024)3 cited
- → Multi-beam mask writing opens up new fields of application(2023)3 cited
- → Realisierung von optischen Talbot- und Talbot-Lau-Teppichen(2010)2 cited
- → MBMW-100 flex, the 1st electron multi-beam mask writer for mature and advanced mask nodes(2023)1 cited
- → New multi-beam mask data preparation method for EUV high volume data(2023)1 cited
- → Matter wave interferometry with large and complex molecules(2011)