Uwe Schroeder
Publications by Year
Research Areas
Ferroelectric and Negative Capacitance Devices, Semiconductor materials and devices, MXene and MAX Phase Materials, Ferroelectric and Piezoelectric Materials, Advanced Memory and Neural Computing
Most-Cited Works
- → Ferroelectricity and Antiferroelectricity of Doped Thin HfO2‐Based Films(2015)1,107 cited
- → Physical Mechanisms behind the Field‐Cycling Behavior of HfO2‐Based Ferroelectric Capacitors(2016)881 cited
- → Incipient Ferroelectricity in Al‐Doped HfO2 Thin Films(2012)823 cited
- → On the structural origins of ferroelectricity in HfO2 thin films(2015)621 cited
- → The fundamentals and applications of ferroelectric HfO2(2022)588 cited
- → Stabilizing the ferroelectric phase in doped hafnium oxide(2015)566 cited
- → Review and perspective on ferroelectric HfO2-based thin films for memory applications(2018)539 cited
- → The Past, the Present, and the Future of Ferroelectric Memories(2020)436 cited
- → Next generation ferroelectric materials for semiconductor process integration and their applications(2021)410 cited
- → Structural Changes Underlying Field‐Cycling Phenomena in Ferroelectric HfO2 Thin Films(2016)409 cited