H. Engelmann
Publications by Year
Research Areas
Semiconductor materials and devices, Copper Interconnects and Reliability, Photorefractive and Nonlinear Optics, Semiconductor materials and interfaces, Glass properties and applications
Most-Cited Works
- → Photorefractive centers in LiNbO3, studied by optical-, Mössbauer- and EPR-methods(1977)272 cited
- → Microstrip-A New Transmission Technique for the Klilomegacycle Range(1952)112 cited
- → Structure and thermal stability of graded Ta–TaN diffusion barriers between Cu and SiO2(2003)67 cited
- → Investigation of Large Intramolecular Movements within Metmyoglobin by Rayleigh Scattering of Mössbauer Radiation (RSMR)(1982)64 cited
- → Integration and optimization of embedded-sige, compressive and tensile stressed liner films, and stress memorization in advanced SOI CMOS technologies(2005)63 cited
- → Influence of nitrogen content on the crystallization behavior of thin Ta–Si–N diffusion barriers(2004)43 cited
- → Influence of N content on microstructure and thermal stability of Ta–N thin films for Cu interconnection(2002)34 cited
- → Influence of Fe-substitution on the high-Tc superconductivity(1988)31 cited
- → Improvement of Electromigration Lifetime of Submicrometer Dual-Damascene Cu Interconnects Through Surface Engineering(2006)27 cited
- → Cobalt-silicide structures studied by Mössbauer spectroscopy(1987)25 cited