Wataru Nihashi
Fujifilm (Japan)(JP)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Nanofabrication and Lithography Techniques, Liquid Crystal Research Advancements, Advanced Surface Polishing Techniques
Most-Cited Works
- → Segregated Donor–Acceptor Columns in Liquid Crystals That Exhibit Highly Efficient Ambipolar Charge Transport(2011)136 cited
- → Negative Tone Imaging Process and Materials for EUV Lithography(2013)17 cited
- → Negative-tone Imaging with EUV Exposure(2015)11 cited
- → Negative-tone imaging with EUV exposure for 14nm hp and beyond(2015)9 cited
- → Novel EUV Resist Materials for 7 nm Node and Beyond(2018)9 cited
- → Negative-tone Imaging with EUV Exposure toward 13 nm hp(2016)9 cited
- → Negative-tone imaging with EUV exposure toward 13nm hp(2016)6 cited
- → Negative tone imaging process and materials for EUV lighography(2013)5 cited
- → Correction to “Segregated Donor–Acceptor Columns in Liquid Crystals That Exhibit Highly Efficient Ambipolar Charge Transport”(2017)4 cited
- → Recent progress of CAR materials for EUV lithography (Conference Presentation)(2017)1 cited