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Kaupo Kukli | doi.page

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Kaupo Kukli

FZU ‒ Institute of Physics of the Academy of Sciences of the Czech Republic(CZ)University of Tartu(EE)

Publications by Year

Research Areas

Semiconductor materials and devices, Electronic and Structural Properties of Oxides, Ferroelectric and Negative Capacitance Devices, Advanced Memory and Neural Computing, Catalytic Processes in Materials Science

Most-Cited Works

→ Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources(2000)483 cited
→ Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates(1996)224 cited
→ Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water(2002)197 cited
→ Crystallization in hafnia‐ and zirconia‐based systems(2004)162 cited
→ Controlled Growth of TaN, Ta₃N₅, and TaO_xN_y Thin Films by Atomic Layer Deposition(1999)158 cited
→ Rare-earth oxide thin films for gate dielectrics in microelectronics(2005)149 cited

→ Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors(2002)

142 cited

→ Atomic Layer Deposition of High‐k Oxides of the Group 4 Metals for Memory Applications(2009)138 cited

→ Recent developments in the MOCVD and ALD of rare earth oxides and silicates(2005)136 cited

→ Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta ( OC 2 H 5 ) 5 and H 2 O(1995)125 cited