H. Lorenz
Publications by Year
Research Areas
Advanced MEMS and NEMS Technologies, Advanced Surface Polishing Techniques, Advancements in Photolithography Techniques, 3D IC and TSV technologies, Additive Manufacturing and 3D Printing Technologies
Most-Cited Works
- → SU-8: a low-cost negative resist for MEMS(1997)969 cited
- → High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS(1998)572 cited
- → Mechanical characterization of a new high-aspect-ratio near UV-photoresist(1998)191 cited
- → 3D microfabrication by combining microstereolithography and thick resist UV lithography(1999)174 cited
- → Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist(1998)149 cited
- → High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications(2002)133 cited
- → Combining microstereolithography and thick resist UV lithography for 3D microfabrication(2002)69 cited
- → Fabrication process of high aspect ratio elastic structures for piezoelectric motor applications(2002)63 cited
- → Fabrication process of high aspect ratio elastic and SU-8 structures for piezoelectric motor applications(1998)62 cited
- → Low-cost technology for multilayer electroplated parts using laminated dry film resist(1996)45 cited