Thorsten Lill
Lam Research (United States)(US)
Publications by Year
Research Areas
Semiconductor materials and devices, Plasma Diagnostics and Applications, Electronic and Structural Properties of Oxides, Copper Interconnects and Reliability, Metal and Thin Film Mechanics
Most-Cited Works
- → Overview of atomic layer etching in the semiconductor industry(2015)586 cited
- → Predicting synergy in atomic layer etching(2017)121 cited
- → Thermal atomic layer etching: A review(2021)117 cited
- → Future of plasma etching for microelectronics: Challenges and opportunities(2024)115 cited
- → Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing(2010)73 cited
- → Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists(2009)71 cited
- → Directional etch of magnetic and noble metals. II. Organic chemical vapor etch(2017)62 cited
- → Highly Selective Directional Atomic Layer Etching of Silicon(2015)47 cited
- → The Cutting Edge of Plasma Etching(2008)44 cited
- → Energy partition inC60-diamond-(111)-surface collisions: A molecular-dynamics simulation(1994)44 cited