Aki Fujimura
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Industrial Vision Systems and Defect Detection, Integrated Circuits and Semiconductor Failure Analysis, 3D IC and TSV technologies
Most-Cited Works
- → A diagonal interconnect architecture and its application to RISC core design(2005)44 cited
- → Very Low Vitamin C Activity of Orally Administered l-Dehydroascorbic Acid(2001)41 cited
- → How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+mask dual simulation(2019)25 cited
- → Study of mask and wafer co-design that utilizes a new extreme SIMD approach to computing in memory manufacturing: full-chip curvilinear ILT in a day(2019)20 cited
- → Optimization of mask shot count using MB-MDP and lithography simulation(2011)17 cited
- → Improvement of mask write time for curvilinear assist features at 22nm(2010)16 cited
- → Writing wavy metal 1 shapes on 22-nm logic wafers with less shot count(2010)15 cited
- → Curvilinear masks: an overview(2021)14 cited
- → Interconnect Characterization of X Architecture Diagonal Lines for VLSI Design(2005)14 cited
- → Adopting curvilinear shapes for production ILT: challenges and opportunities(2019)13 cited