S. Tachi
Publications by Year
Research Areas
Semiconductor materials and devices, Plasma Diagnostics and Applications, Ion-surface interactions and analysis, Metal and Thin Film Mechanics, Integrated Circuits and Semiconductor Failure Analysis
Most-Cited Works
- → Low-temperature reactive ion etching and microwave plasma etching of silicon(1988)327 cited
- → Low-temperature dry etching(1991)149 cited
- → Chemical sputtering of silicon by F+, Cl+, and Br+ ions: Reactive spot model for reactive ion etching(1986)105 cited
- → Low-energy mass-separated ion beam deposition of materials(1981)55 cited
- → Deposition in Dry-Etching Gas Plasmas(1992)44 cited
- → Low-Temperature Microwave Plasma Etching of Crystalline Silicon(1991)38 cited
- → Chemical and Physical Roles of Individual Reactive Ions in Si Dry Etching(1982)37 cited
- → Chemical sputtering yields of silicon resulting from F+, CFn+ (n = 1,2,3) ion bombardment(1982)36 cited
- → Electrical Properties of Focused-Ion-Beam Boron-Implanted Silicon(1983)34 cited
- → Surface stoichiometry, structure, and chemisorption on silicon nitride studied by direct recoiling, x-ray photoelectron spectroscopy, and Auger electron spectroscopy(1986)29 cited