Michaela Vockenhuber
Paul Scherrer Institute(CH)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Electron and X-Ray Spectroscopy Techniques, Nanofabrication and Lithography Techniques, Advanced Surface Polishing Techniques
Most-Cited Works
- → Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)(2014)171 cited
- → Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond(2013)78 cited
- → Extreme ultraviolet patterning of tin-oxo cages(2017)66 cited
- → Improvements in resist performance towards EUV HVM(2017)62 cited
- → EUV resists based on tin-oxo clusters(2014)57 cited
- → High-sensitivity molecular organometallic resist for EUV (MORE)(2015)51 cited
- → Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure(2018)49 cited
- → Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy(2020)48 cited
- → Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters(2019)48 cited
- → Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists(2019)47 cited