S. Jaloviar
Intel (United States)(US)
Publications by Year
Research Areas
Advancements in Semiconductor Devices and Circuit Design, Semiconductor materials and devices, Ferroelectric and Negative Capacitance Devices, Parallel Computing and Optimization Techniques, Thin-Film Transistor Technologies
Most-Cited Works
- → A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors(2012)750 cited
- → A 10nm high performance and low-power CMOS technology featuring 3rd generation FinFET transistors, Self-Aligned Quad Patterning, contact over active gate and cobalt local interconnects(2017)359 cited
- → 45nm High-k + metal gate strain-enhanced transistors(2008)204 cited
- → Future of plasma etching for microelectronics: Challenges and opportunities(2024)115 cited
- → Intel 4 CMOS Technology Featuring Advanced FinFET Transistors optimized for High Density and High-Performance Computing(2022)42 cited
- → Intel 18A Platform Technology Featuring RibbonFET (GAA) and PowerVia for Advanced High-Performance Computing(2025)8 cited
- → An Intel 3 Advanced FinFET Platform Technology for High Performance Computing and SOC Product Applications(2024)8 cited