Sungseo Cho
Samsung (South Korea)(KR)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Copper Interconnects and Reliability, Nanofabrication and Lithography Techniques, Semiconductor materials and devices, ZnO doping and properties
Most-Cited Works
- → Sol–Gel Solution-Deposited InGaZnO Thin Film Transistors(2014)113 cited
- → 157 nm resist materials: Progress report(2000)29 cited
- → Improving the performance of 193-nm photoresists based on alicyclic polymers(1998)19 cited
- → Recent Advancements In Cycloolefin Based Resists For ArF Lithography.(1998)13 cited
- → Negative-tone 193-nm resists(2000)8 cited
- → Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists(1999)6 cited
- → Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness(2000)3 cited
- → Design and Study of Silicone-based Materials for Bilayer Resist Application(2004)2 cited
- → Investigation of a fluorinated ESCAP-based resist for 157-nm lithography(2002)1 cited
- → Design and study of resist materials for 157-nm lithography(2003)1 cited