Mitsuhiro Omura
Publications by Year
Research Areas
Semiconductor materials and devices, Advancements in Photolithography Techniques, Plasma Diagnostics and Applications, Block Copolymer Self-Assembly, Advanced Surface Polishing Techniques
Most-Cited Works
- → Future of plasma etching for microelectronics: Challenges and opportunities(2024)115 cited
- → High-Performance FinFET with Dopant-Segregated Schottky Source/Drain(2006)53 cited
- → Sidewall transfer process and selective gate sidewall spacer formation technology for sub-15nm finfet with elevated source/drain extension(2006)44 cited
- → Formation mechanism of sidewall striation in high-aspect-ratio hole etching(2019)40 cited
- → Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation(2019)34 cited
- → Sub-30nm via interconnects fabricated using directed self-assembly(2013)24 cited
- → Electrical Via Chain Yield for DSA Contact Hole Shrink Process(2013)17 cited
- → A 0.602 /spl mu/m/sup 2/ nestled 'Chain' cell structure formed by one mask etching process for 64 Mbit FeRAM(2004)16 cited
- → Compensating of room acoustic transfer functions affected by change of room temperature(1999)11 cited
- → High aspect ratio SiO2/SiN (ON) stacked layer etching using C3HF5, C4H2F6, and C4H4F6(2024)11 cited