Mike Meyer
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Industrial Vision Systems and Defect Detection, Advanced Neural Network Applications, Information Retrieval and Search Behavior, Optical measurement and interference techniques
Most-Cited Works
- → Overlapping experiment infrastructure(2010)316 cited
- → Fast all-angle Mask 3D for ILT patterning(2020)7 cited
- → Five deep learning recipes for the mask-making industry(2019)4 cited
- → Making digital twins using the Deep Learning Kit (DLK)(2019)3 cited
- → How GPU-accelerated simulation enables applied deep learning for masks and wafers(2019)1 cited
- P. I. TECHNIQUES FOR EKTACHROME IR TRANSPARENCIES(1969)