Jiong Jiang
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Industrial Vision Systems and Defect Detection, Silicon and Solar Cell Technologies
Most-Cited Works
- → Fast and accurate 3D mask model for full-chip OPC and verification(2007)47 cited
- → Mask aspects of EUVL imaging at 27nm node and below(2011)16 cited
- → Imaging performance improvements by EUV mask stack optimization(2011)10 cited
- → Feasibility study of the approach to flare, shadowing, optical and process corrections for EUVL OPC(2009)6 cited
- → Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification(2011)6 cited
- → Separable OPC models for computational lithography(2008)6 cited
- → Accurate models for EUV lithography(2009)5 cited
- → Model calibration and validation for pre-production EUVL(2012)3 cited
- → Holistic lithography for EUV: NXE:3100 characterization of first printed wafers using an advanced scanner model and scatterometry(2011)2 cited
- Optical design and manufacturing of precision mould for Led projecting clock and timer(2008)