Yuri Granik
Siemens (United States)(US)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced Surface Polishing Techniques, Electron and X-Ray Spectroscopy Techniques, Industrial Vision Systems and Defect Detection
Most-Cited Works
- → Fast pixel-based mask optimization for inverse lithography(2006)119 cited
- → Solving inverse problems of optical microlithography(2005)65 cited
- → Correction for etch proximity: new models and applications(2001)62 cited
- → Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications(2014)52 cited
- → Model-based OPC using the MEEF matrix(2002)50 cited
- → Source optimization for image fidelity and throughput(2004)35 cited
- → Universal process modeling with VTRE for OPC(2002)34 cited