Yee Mei Foong
GlobalFoundries (Singapore)(SG)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Industrial Vision Systems and Defect Detection, Integrated Circuits and Semiconductor Failure Analysis, Welding Techniques and Residual Stresses
Most-Cited Works
- → Optimizing OPC data sampling based on "orthogonal vector space"(2011)16 cited
- → Process window enhancement using advanced RET techniques for 20nm contact layer(2014)15 cited
- → Evaluation of compact models for negative-tone development layers at 20/14nm nodes(2015)11 cited
- → Sub-resolution assist feature (SRAF) printing prediction using logistic regression(2015)5 cited
- → Aerial image metrology for OPC modeling and mask qualification(2017)5 cited
- → Evaluation of alignment marks using ASML ATHENA alignment system in 90-nm BEOL process(2003)5 cited
- → Compact modeling of negative tone development resist with photo decomposable quencher(2019)4 cited
- → Effect of mask 3D and scanner focus difference on OPC modeling and verification(2014)3 cited
- → OPC model prediction capability improvements by accounting for mask 3D-EMF effects(2012)3 cited
- → Effective use of aerial image metrology for calibration of OPC models(2017)2 cited