Jeroen Meessen
ASML (Netherlands)(NL)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced Surface Polishing Techniques, Surface and Thin Film Phenomena
Most-Cited Works
- → Pitch doubling through dual-patterning lithography challenges in integration and litho budgets(2007)87 cited
- → Evaluation of EUV resist performance below 20nm CD using helium ion lithography(2014)14 cited
- → Nano-engineering with a focused helium ion beam(2011)11 cited
- → CD bias reduction in CD-SEM linewidth measurements for advanced lithography(2008)10 cited
- → Estimation of pattern shape based on CD-SEM image by using MPPC method(2006)9 cited
- → Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment(2015)8 cited
- → Separable OPC models for computational lithography(2008)6 cited
- → Total test repeatability: a new figure of merit for CD metrology tools(2004)5 cited
- → Metrology challenges for advanced lithography techniques(2007)5 cited
- → OPC cycle time reduction and accuracy improvement by early access to advanced Tachyon modeling of TWINSCAN XT:1900i scanner(2008)4 cited