T. Sorsch
Alcatel Lucent (Germany)(DE)
Publications by Year
Research Areas
Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design, Photonic and Optical Devices, Integrated Circuits and Semiconductor Failure Analysis, Advanced MEMS and NEMS Technologies
Most-Cited Works
- → The electronic structure at the atomic scale of ultrathin gate oxides(1999)958 cited
- → Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si–O–H) and thermal oxide (SiO2 or Si–O–N) underlayers(2002)279 cited
- → Ultra-thin gate dielectrics: they break down, but do they fail?(2002)205 cited
- → Multi-component high-K gate dielectrics for the silicon industry(2001)124 cited
- → The Vertical Replacement-Gate (VRG) MOSFET: a 50-nm vertical MOSFET with lithography-independent gate length(2003)91 cited
- → Low leakage, ultra-thin gate oxides for extremely high performance sub-100 nm nMOSFETs(2002)85 cited
- → Nanopores in solid-state membranes engineered for single molecule detection(2010)83 cited
- → Gate oxide reliability projection to the sub-2 nm regime(2000)80 cited
- → The ballistic nano-transistor(2003)76 cited
- → Understanding the limits of ultrathin SiO2 and SiON gate dielectrics for sub-50 nm CMOS(1999)70 cited